A scanning electron microscope (also commonly abbreviated as SEM) uses beams of electrons to create magnified images of samples, as opposed to beams of light that a traditional microscope uses. Because the scanning electron microscope can magnify a sample up to 500,000 times its normal size and determine its chemical makeup, scanning electron microscopes have a wide range of applications. They are used for quality control in both the pharmaceutical and semiconductor industries, sample comparisons in forensics, diagnostics in medical labs, and in research labs to determine the composition of samples treated in different ways. Scanning electron microscopes have different kinds of signal detectors available that include back-scattered electrons (for imaging), characteristic X-rays (for determining types and amounts of elements present in the sample), transmitted electrons, and cathodoluminescence. Other variations in different scanning electron microscopes include availability of low or high vacuum mode and imaging options for bright field samples and/or dark field samples.
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Select up to 5 products from below to compare or request more information.
- Type: Microanalysis, High Vac and Variable Pressure
- Resolution: 135 eV (EDX)
- Total Magnification: Inquire
- Type: Time-critical Microanalysis, High-Vac and Low-Vacuum Variable Pressure
- Resolution: 130 eV (EDX), 30 nm (Image)
- Total Magnification: Inquire
- Type: SEM/EDX, Microanalysis
- Resolution: Inquire
- Total Magnification: Inquire
Carl Zeiss Microscopy, LLC
- Type: Analytical, FIB-SEM
- Resolution: SEM (GEMINI column): 1.0 nm (@ 15 kV) or 1.9 nm (@ 1 kV); FIB (@ 30 kV): < 2.5 nm (Cobra column) or < 7 nm (Canion column)
- Total Magnification: 12x to 1000kx (SEM) or 300x to 500kx (FIB)
Carl Zeiss Microscopy, LLC
- Type: Analytical, Variable Pressure
- Resolution: 1.9 to 10 nm (depending on acceleration voltage)
- Total Magnification: < 5x to 1,000,000x
Carl Zeiss Microscopy, LLC
- Type: Analytical, Variable Pressure
- Resolution: 3 to 20 nm (depending on acceleration voltage and system configuration)
- Total Magnification: < 7x to 1,000,000x (LS 10) or < 5x to 1,000,000x
Carl Zeiss Microscopy, LLC
- Type: Analytical, Variable Pressure
- Resolution: 3 to 20 nm (depending on acceleration voltage)
- Total Magnification: < 7x to 1,000,000x (MA 10) or < 5x to 1,000,000x
Carl Zeiss Microscopy, LLC
- Type: Analytical, FE
- Resolution: 0.6 to 3.0 nm (depending on acceleration voltage and system configuration)
- Total Magnification: 12x to 2,000,000x (SE mode) or 100x to 2,000,000x (with EsB detector)
Carl Zeiss Microscopy, LLC
- Type: Analytical, FE
- Resolution: 1.3 to 2.8 nm (depending on acceleration voltage and model)
- Total Magnification: 12x to 1,000,000x
Carl Zeiss Microscopy, LLC
- Type: Analytical, FE
- Resolution: 1.0 to 2.0 nm (depending on acceleration voltage, system configuration and model)
- Total Magnification: 12x to 1,000,000x
Carl Zeiss Microscopy, LLC
- Type: Analytical, FE
- Resolution: 0.8 nm (@ 30 kV - STEM mode), 0.8 nm (@ 15 kV) or 1.6 nm (@ 1 kV)
- Total Magnification: 12x to 1,000,000x (SE mode) or 100x to 1,000,000x (with EsB detector)
Hitachi High Technologies America, Inc.
- Type: FIB-SEM
- Resolution: FIB: 5 nm (@ 40 kV); SEM: 1.0 nm (@ 15 kV)
- Total Magnification: FIB: 60x to 250,000x; SEM: 70x to 2000x (LM mode) or 250 to 800,000 (HM mode)
Hitachi High Technologies America, Inc.
- Type: Variable Pressure
- Resolution: 3.0 or 4.0 nm
- Total Magnification: Inquire
Hitachi High Technologies America, Inc.
- Type: Variable Pressure
- Resolution: 3.0 or 4.0 nm
- Total Magnification: 5x to 300,000x
Hitachi High Technologies America, Inc.
- Type: UHR, Analytical, FE
- Resolution: 1.0 (at 15 kV) or 1.6 nm (at 1 kV)
- Total Magnification: 20x to 800,000x
Hitachi High Technologies America, Inc.
- Type: Variable Pressure
- Resolution: 3.0 or 4.0 nm
- Total Magnification: Inquire
Hitachi High Technologies America, Inc.
- Type: Analytical
- Resolution: 7 nm at 3 kV (SE),10 nm at 5 KV (BSE)
- Total Magnification: 5 × 300,000x (photo) ; 7 × 800,000x (display)
Hitachi High Technologies America, Inc.
- Type: Analytical, Variable Pressure
- Resolution: 1.2 or 3.0 nm
- Total Magnification: Inquire
Hitachi High Technologies America, Inc.
- Type: UHR, FE-SEM
- Resolution: 1.3 nm at 1.0kV
- Total Magnification: 20 to 25,000x (Low mag mode), 100 to 2,000,000x (High mag mode)
Hitachi High Technologies America, Inc.
- Type: UHR, FE-SEM
- Resolution: STEM: 0.34 nm (30 kV, sample height 0.0 mm, Lattice Image); SE: 0.4 nm (30 kV, sample height 1.0 mm, 800 kx) or 1.2 nm (1 kV, sample height 2.0 mm, 250 kx)
- Total Magnification: LM Mode: 80x to 10,000x (on Photo) or 220x to 25,000x (on Display); HM Mode: 800x to 3,000,000x (on Photo) or 2200x to 8,000,000x (on Display)
Hitachi High Technologies America, Inc.
- Type: Tabletop
- Resolution: Inquire
- Total Magnification: 15x to 30,000x (Digital Zoom to 120,000x)
- Type: Analytical, Benchtop
- Resolution: 25 nm
- Total Magnification: 10x to 20,000x
- Type: Scanning
- Resolution: 25 nm
- Total Magnification: 20 to 45,000x
- Type: Scanning
- Resolution: 30 nm
- Total Magnification: 20 to 17,000x
- Type: Analytical, X-ray Analysis
- Resolution: 25 nm (at 10 kV)
- Total Magnification: 80 to 45,000x
- Type: Analytical, X-ray Analysis, Integrated Elemental mapping, Line Scan
- Resolution: 25 nm (at 10 kV)
- Total Magnification: 20 to 45000x
- Type: Analytical Scanning
- Resolution: 0.8 nm (15 kV in SE mode), 0.9 nm (1 kV in SE mode) and 1.5 nm (200 V in SE mode)
- Total Magnification: Inquire
Inquire
- Type: Atomic force microscopy/Scanning Tunneling Microscopy
- Resolution: Inquire
- Total Magnification: Inquire
Inquire
- Type: Analytical, Variable Pressure
- Resolution: SE: 3 nm (30 kV) or 8 nm (3 kV); Low Vacuum (BSE): 3.5 nm (30 kV)
- Total Magnification: Inquire
Inquire
- Type: Analytical, FIB-SEM, FE
- Resolution: Inquire
- Total Magnification: Inquire
Inquire
- Type: FIB-SEM, FE, Micro-analytical, High Vacuum / Variable Pressure
- Resolution: SEM Column (SE): 1.2 nm (at 30 kV); FIB Column (SE): <5 nm (at 30 kV)
- Total Magnification: 2x to 1,000,000x
Inquire
- Type: Analytical, FE, High Vacuum / Variable Pressure
- Resolution: In-Beam SE: 1 nm (at 30 kV) or 1.8 nm (at 1 kV); SE-ET: 1.2 nm (at 30 kV) or .5 nm (at 3 kV); Low Vacuum (LVSTD): 1.5 nm (at 30 kV) or 3 nm (at 3kV)
- Total Magnification: 3.5x to 1,000,000x
Inquire
- Type: Analytical, FE, High Vacuum / Variable Pressure
- Resolution: In-Beam SE: 1.0 nm (at 30 kV) or 1.8 nm (at 1 kV); SE-ET: 1.2 nm (at 30 kV) or 2.5 nm (at 3 kV); High/Low Vacuum (BSE): 2.0 nm (at 30 kV)
- Total Magnification: 2x to 1,000,000x
Inquire
- Type: Analytical, High Vacuum / Variable Pressure
- Resolution: SE: 2 or 3 nm (at 30 kV), 5 or 8 nm (at 3 kV); Low Vacuum (BSE, LVSTD): 2.5 or 3.5 nm (at 30 kV)
- Total Magnification: Inquire
Inquire
- Type: Analytical, High Vacuum / Variable Pressure
- Resolution: SE: 3 nm (at 30 kV) or 8 nm (at 3 kV); Low Vacuum (BSE, LVSTD): 3.5 nm (at 30 kV)
- Total Magnification: Inquire
Inquire
- Type: Analytical, High Vacuum / Variable Pressure
- Resolution: SE: 2 or 3 nm (at 30 kV), 5 or 8 nm (at 3 kV); Low Vacuum (BSE): 2.5 or 3.5 nm (at 30 kV)
- Total Magnification: Inquire
Inquire
- Type: Micro-analytical, High Vacuum / Variable Pressure
- Resolution: SEM Column (SE): 3.5 nm (at 30 kV); FIB Column (SE): <5 nm (at 30 kV)
- Total Magnification: 2x to 1,000,000x
Inquire
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