Description
Hexamethyldisiloxane (HMDSO), a linear polydisiloxane, is an organosilicon reagent commonly utilized as a source for plasma enhanced chemical vapor deposition (PE-CVD) of thin films of silicon compounds. It is also employed as a substitute to silane in silicon integrated circuit technology. Its dissociative ionization by electron impact has been studied by Fourier transform mass spectrometry. Synthesis of plasma-polymerized HMDSO thin films by atmospheric pressure glow (APG) discharge has been reported. Crystals of HMDSO at 148K are monoclinic.Hexamethyldisiloxane can be used:· To fabricate a gas diffusion layer (GDL) with controlled hydrophobic silicone nano-layer by the dry deposition process.· To prepare silver nanoparticles coated with silica using arginine and glucose as the catalyst and the reducing agent, respectively