Description
JEOL has more than 50 years of e-beam expertise. Our latest generation of direct write tools, the JEOL JBX-8100FS series spot beam, vector scan, step-and-repeat lithography system is designed for higher throughput and lower operating costs.
The JBX-8100FS writes ultrafine patterns at a faster rate of speed while minimizing idle time, especially during the exposure process, thus increasing throughput.
Key Features:
- Small footprint
- Low power consumption
- High throughput
- ZrO/W (Schottky) Emitter
- Stage positions measured and controlled in 0.6nm steps (0.15nm steps optional)
- Field size 100 μm × 100 μm (high resolution mode) and 1,000 μm × 1,000 μm (high throughput mode)
- Overlay accuracy ±9 nm or less (high resolution mode) and ±20 nm or less (high throughput mode)
- Sample size - wafers up to 200mm, masks up to 6-inch, micro samples of any size