Hiden Analytical release a new brochure detailing their range of
mass spectrometer products specifically developed for
specialised vacuum process applications under diverse pressure
regimes from sub-atmospheric to ultra-high vacuum.
New Brochure Spread: Mass Spectrometers for Thin Films,
Plasma & Surface Engineering
The application-specific systems are configured for monitoring,
controlling and analysing varied processes related to thin film
deposition, to plasma and ion beam etching, and to thermal
reaction and desorption processes. Systems are available for
real-time measurement of gas composition and of both positive
and negative plasma ion species and ion energies, supplied fully
engineered with dedicated process interface. Applicable process
techniques include ALD, CVD and MOCVD, MBE, RIE and IBE/
RIBE.
Combined secondary ion and secondary neutral mass
spectrometers (SIMS/SNMS) provide post-process quantitative
measurement of product surface and subsurface composition.
These systems are supplied as complete workstations and also in
component form for upgrade of existing UHV surface analysis
tools.
For a copy of the brochure and further information on all Hiden
Analytical products contact Hiden Analytical at [email protected]
or visit the main website at www.HidenAnalytical.com.
Hiden Analytical Ltd
420 Europa Boulevard
Warrington
WA5 7UN, England
+44 (0)1925 445 225
[email protected]