Spellman High Voltage Electronics Corp has announced their new integrated, multiple output high-voltage power supply specifically designed for focused ion beam applications. Applications of focused ion beam technology are used in the semiconductor industry, materials science and biological field for imaging, etching and deposition of materials.
Each unit is equipped with high stability accelerator voltage and floating outputs to drive traditional Ga Ion and Plasma Sources. An additional lens chassis is available, enabling high performance fixed or reversible polarity high voltage lenses required to focus the Ion Beam. Both the main chassis and lens chassis are 19’ rack-mountable. It has very low ripple and ultra-stable outputs, as well as a robust arc and short circuit protection.
Designed to minimize micro-discharge events, the Main Chassis provides an Acceleration voltage up to 35kV, with floating filament, extractor and suppressor outputs. The lens chassis offers Lens voltages up to 30kV, with fixed or reversible polarity. All outputs are offered with ultra-low output ripple, exceptional regulation, stability, temperature coefficient, drift and accuracy specifications. Isolation and control of the respective floating sources are provided via Spellman’s proprietary high voltage isolation techniques. The user's control of this integrated FIB power supply system is accomplished via a fiber optic interface. All high voltage safety interlocks utilize failsafe hardware-based designs. The FIB is CE marked and is designed to be compliant with applicable IEC, UL and SEMI standards.