| Description | Wafer XRD 200 is your fully automated high-speed X-ray diffraction platform for wafer production and research as you have never seen it before.
Wafer XRD 200 provides key data on a variety of essential parameters such as crystal orientation and resistivity, geometric features like notches and Wafer XRD 200 is your fully automated high-speed X-ray diffraction platform for wafer production and research as you have never seen it before.
Wafer XRD 200 provides key data on a variety of essential parameters such as crystal orientation and resistivity, geometric features like notches and flats, distance measurements, and much more – within just a few seconds. Designed to fit seamlessly into your process line.
Features and Benefits - Ultra-fast precision with proprietary scan technology
The method requires only one wafer rotation to gather all the necessary data to fully determine the orientation, which delivers high precision at a very low measuring time – in the range of a few seconds.
- Fully automated handling and sorting
Wafer XRD 200 is designed to optimize your throughput and productivity. Full automation of handling and sorting and detailed data transmission tools, make it a powerful and efficient element in your QC process.
- Easy connectivity
Wafer XRD 200’s powerful automation is compatible with both MES and SECS/GEM interfaces. It fits easily into your new or existing process.
- High precision, deeper insight
Understand your materials like never before with Wafer XRD 200’s key measurements. Wafer XRD 200 measures:
-Crystal orientation
-Notch position, depth, and opening angle
-Diameter
-Flat position and length
-Resistivity
The typical standard deviation tilt (example: Si 100) for the Azimuthal-scan is <0.003o, minimum <0.001o.
- Powerful and versatile
The Wafer XRD 200 makes a wide range of measurements possible at speed – which will add real value to your processes, whether in research or production. But that is not the only way in which the Wafer XRD 200 is versatile and flexible.
Wafer XRD 200 makes analysis easy and fast for hundreds of potential samples, including:
-Si
-SiC
-AlN
-Al2O3 (sapphire)
-GaAs
-Quartz
-LiNbO3
-BBO
... Read More | Produce greener and more efficient. The Cement edition of Aeris is an easy-to-use and automatable compact instrument for every stage of the cement production process, from raw
meal, clinker and (blended) cement to the final product.
Aeris is ideal for process control in cement plants and Produce greener and more efficient. The Cement edition of Aeris is an easy-to-use and automatable compact instrument for every stage of the cement production process, from raw
meal, clinker and (blended) cement to the final product.
Aeris is ideal for process control in cement plants and automated Rietveld quantitative analysis
of cement products for related industries such as Departments of Transportation. This compact
instrument is smaller and easier to use than floorstanding equipment and more powerful than
benchtop systems. Aeris delivers the precision, robustness, and efficiency that our customers
know and love – providing outstanding quality with all the convenience of a smaller footprint (no
external cooler required).
Aeris has an optional six position changer, and is automatable – external sample loading from
belt or robot are possible. Aeris has best in class dust protection, with a rating of IP40.
Features:
- Seamless integration in automation - for high sample throughput Aeris can be
connected with a belt or a robot for fast and automated sample processing.
- Fast analysis, maximum uptime - analysis time for clinker or cement is just 5 minutes.
- Industry ready - Compatible with all common industry standards.
... Read More | Meet the new compact XRD system from Malvern Panalytical - Aeris. The Metals edition of Aeris
is ideal for rapid and reliable analysis of direct reduced iron, sinter and retained austenite. The
Aeris Compact is just right. It delivers the precision, robustness, and efficiency that our
customers Meet the new compact XRD system from Malvern Panalytical - Aeris. The Metals edition of Aeris
is ideal for rapid and reliable analysis of direct reduced iron, sinter and retained austenite. The
Aeris Compact is just right. It delivers the precision, robustness, and efficiency that our
customers know and love – providing outstanding quality with all the convenience of a smaller
footprint. It has an optional six position changer, and is automatable – external sample loading
from belt or robot are possible. Aeris has best in class dust protection, with a rating of IP40.
The Aeris Metals edition is your partner at every stage of the production process, from raw
material to the final product.
Features:
- Seamless integration in automation - for high sample throughput Aeris can be
connected with a belt or a robot for fast and automated sample processing.
- Fast analysis, maximum uptime - mineralogical information is available within 5 minutes.
- Strong and robust - Compatible with all common industry standards
... Read More | Meet the Wafer XRD 300: your high-speed X-ray diffraction module for 300mm wafer production providing key data on a variety of essential parameters such as crystal orientation and geometric features like notches, flats, and much more – designed to fit seamlessly into your process line.
Features Meet the Wafer XRD 300: your high-speed X-ray diffraction module for 300mm wafer production providing key data on a variety of essential parameters such as crystal orientation and geometric features like notches, flats, and much more – designed to fit seamlessly into your process line.
Features and Benefits - Ultra-fast precision with our proprietary scan technology
The used method requires only one rotational scan to gather all the necessary data to fully determine the crystal orientation, which delivers high precision at a very low measuring time – in the range of a few seconds.
- Fully automated handling and sorting
Wafer XRD 300 is designed to maximize your throughput and productivity. Full integration into your handling and sorting automation makes it a powerful and efficient addition to your process.
- Easy connectivity
Wafer XRD 300’s powerful automation fits easily into your new or existing process, as it is compatible with both MES and SECS/GEM interfaces.
- High precision, deeper insight
Understand your materials like never before with Wafer XRD 300’s key measurements including:
-Crystal orientation
-Notch position, depth, and opening angle
-Diameter
-Flat position and length
-Further sensors available on request
The typical standard deviation tilt (example: Si 100) for the Azimuthal-scan is <0.003o.
- Powerful and versatile
As semiconductor research evolves, it has never been more important to measure a variety of samples. Wafer XRD 300 makes analysis easy and fast for hundreds of materials, including:
-Si
-SiC
-AlN
-Al2O3 (sapphire)
-GaAs
-Quartz
-LiNbO3
-BBO
... Read More | The X’Pert3 Materials Research Diffractometer (MRD) is the system of choice for detailed structural analysis of advanced semiconductors, thin film, and nanomaterials. It handles a wide variety of X-ray scattering methods, including high resolution diffraction, in-plane diffraction, reflectivity, The X’Pert3 Materials Research Diffractometer (MRD) is the system of choice for detailed structural analysis of advanced semiconductors, thin film, and nanomaterials. It handles a wide variety of X-ray scattering methods, including high resolution diffraction, in-plane diffraction, reflectivity, thin film phase analysis, wafer mapping, GISAXS, stress, texture and nonambient analysis. The X’Pert3 MRD features the highest resolution goniometer with Heidenhain encoders for lightening fast positioning, a 5 axis cradle allowing for support and mapping of wafers up to 6 inches in diameter, and a wide variety of advanced optics and detectors, including the PIXcel3D for fast reciprocal space mapping.... Read More |