X-ray diffraction (XRD) allows one to ascertain the molecular structure of a crystalline material by diffracting X-rays through the sample. An XRD analyzer obtains interference patterns reflecting lattice structures by varying the angle of incidence of the X-ray beam. Thus, the precision, speed of rotation, and beam size of the X-rays become important parameters by which to judge products. Benchtop XRD can be targeted for single crystal diffraction for imaging lattices; powder diffraction for phase determination; identifying unfamiliar substances for use in inspection, crystallography, and pharmaceutical research correlating crystal structures with drug efficacy. X-ray generators can reach 18 KW in power and detectors typically come as compound silicon arrays, Peltier-Cooled, Silicon Drift, or Scintillation Counter variants. Software targeted for specific XRD applications is available for upgrade in some analyzer models.
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| Company | Malvern Panalytical | Malvern Panalytical |
| Item | Crystal Orientation Wafer XRD 200 - Automated Wafer Quality Control | X'Pert3 MRD Materials Research X-ray Diffraction System |
| Catalog Number | Wafer XRD 200 | X'Pert 3 MRD |
| Price | | |
| X-Ray Tube | Inquire | Empyrean X-ray tube, choice of anodes: Cu, Co, Cr, Mo, Ag |
| X-Ray Generator | Inquire | 3 kW generator supporting all current and future X-ray tubes |
| Goniometer Type | Inquire | High resolution, with Heidenhain encoders |
| Detector(s) | Inquire | PIXcel3D 3D Detection System, X'Celerator, Xenon Proportional Detector |
| Description | Wafer XRD 200 is your fully automated high-speed X-ray diffraction platform for wafer production and research as you have never seen it before.
Wafer XRD 200 provides key data on a variety of essential parameters such as crystal orientation and resistivity, geometric features like notches and Wafer XRD 200 is your fully automated high-speed X-ray diffraction platform for wafer production and research as you have never seen it before.
Wafer XRD 200 provides key data on a variety of essential parameters such as crystal orientation and resistivity, geometric features like notches and flats, distance measurements, and much more – within just a few seconds. Designed to fit seamlessly into your process line.
Features and Benefits - Ultra-fast precision with proprietary scan technology
The method requires only one wafer rotation to gather all the necessary data to fully determine the orientation, which delivers high precision at a very low measuring time – in the range of a few seconds.
- Fully automated handling and sorting
Wafer XRD 200 is designed to optimize your throughput and productivity. Full automation of handling and sorting and detailed data transmission tools, make it a powerful and efficient element in your QC process.
- Easy connectivity
Wafer XRD 200’s powerful automation is compatible with both MES and SECS/GEM interfaces. It fits easily into your new or existing process.
- High precision, deeper insight
Understand your materials like never before with Wafer XRD 200’s key measurements. Wafer XRD 200 measures:
-Crystal orientation
-Notch position, depth, and opening angle
-Diameter
-Flat position and length
-Resistivity
The typical standard deviation tilt (example: Si 100) for the Azimuthal-scan is <0.003o, minimum <0.001o.
- Powerful and versatile
The Wafer XRD 200 makes a wide range of measurements possible at speed – which will add real value to your processes, whether in research or production. But that is not the only way in which the Wafer XRD 200 is versatile and flexible.
Wafer XRD 200 makes analysis easy and fast for hundreds of potential samples, including:
-Si
-SiC
-AlN
-Al2O3 (sapphire)
-GaAs
-Quartz
-LiNbO3
-BBO
... Read More | The X’Pert3 Materials Research Diffractometer (MRD) is the system of choice for detailed structural analysis of advanced semiconductors, thin film, and nanomaterials. It handles a wide variety of X-ray scattering methods, including high resolution diffraction, in-plane diffraction, reflectivity, The X’Pert3 Materials Research Diffractometer (MRD) is the system of choice for detailed structural analysis of advanced semiconductors, thin film, and nanomaterials. It handles a wide variety of X-ray scattering methods, including high resolution diffraction, in-plane diffraction, reflectivity, thin film phase analysis, wafer mapping, GISAXS, stress, texture and nonambient analysis. The X’Pert3 MRD features the highest resolution goniometer with Heidenhain encoders for lightening fast positioning, a 5 axis cradle allowing for support and mapping of wafers up to 6 inches in diameter, and a wide variety of advanced optics and detectors, including the PIXcel3D for fast reciprocal space mapping.... Read More |
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