| Description | Meet the new compact XRD system from Malvern Panalytical - Aeris. The Metals edition of Aeris
is ideal for rapid and reliable analysis of direct reduced iron, sinter and retained austenite. The
Aeris Compact is just right. It delivers the precision, robustness, and efficiency that our
customers Meet the new compact XRD system from Malvern Panalytical - Aeris. The Metals edition of Aeris
is ideal for rapid and reliable analysis of direct reduced iron, sinter and retained austenite. The
Aeris Compact is just right. It delivers the precision, robustness, and efficiency that our
customers know and love – providing outstanding quality with all the convenience of a smaller
footprint. It has an optional six position changer, and is automatable – external sample loading
from belt or robot are possible. Aeris has best in class dust protection, with a rating of IP40.
The Aeris Metals edition is your partner at every stage of the production process, from raw
material to the final product.
Features:
- Seamless integration in automation - for high sample throughput Aeris can be
connected with a belt or a robot for fast and automated sample processing.
- Fast analysis, maximum uptime - mineralogical information is available within 5 minutes.
- Strong and robust - Compatible with all common industry standards
... Read More | Ultra-fast, precise (up to (1/100)o crystal orientation at your fingertips. DDCOM acquires reliable results more than 100 times faster than the traditional methods with additional time savings due to the top down-measurement geometry. This highly versatility instrument utilizes an air-cooled X-ray Ultra-fast, precise (up to (1/100)o crystal orientation at your fingertips. DDCOM acquires reliable results more than 100 times faster than the traditional methods with additional time savings due to the top down-measurement geometry. This highly versatility instrument utilizes an air-cooled X-ray tube and portable design to ensure lower running costs and maximum convenience, ideal for quality control, marking, and research applications.
Features and Benefits
- Ultra fast accuracy
Our proprietary scan method requires only one scan rotation to gather all the necessary data for crystal orientation determination, delivering precise results in 10 seconds (single rotation).
The material-specific instrument geometry enables the orientation of the crystal lattice to be measured in relation to the rotation axis ultra-fast with precision increasing with a number of scan rotations.
- Compact, user-friendly format
The compact design of DDCOM allows the system to fit into any setting. The software is both powerful and intuitive, making it convenient and easy to operate for a range of users.
- Precise, efficient control
Maintain control of cutting, grinding, and lapping processes with high precision up to 1/100o. DDCOM delivers complete lattice orientation of single crystals and is designed for the azimuthal setting and marking of crystal orientation.
Pre-programmed crystal parameters enable the determination of arbitrary unknown orientation of various structures and aid in refining the workflow for greater efficiency. Various stage accessories enable metrology in different process steps.
- Versatile and cost-effective
DDCOM is well-equipped for both research and production environments in which a range of sample types need to be analyzed. Operating costs are low for the DDCOM, thanks to its low energy consumption and air-cooled X-ray tube – no water cooling is required.
The instrument can measure a range of different materials with varying structures making it a versatile addition to any laboratory. Some examples of measurable materials include:
-Cubic, arbitrary unknown orientation: Si, Ge, GaAs, GaP, InP
-Cubic, special orientation: Ag, Au, Ni, Pt, GaSb, InAs, InSb, AlSb, ZnTe, CdTe, SiC3C, PbS, PbTe, SnTe, MgO, LiF, MgAl2O4, SrTiO3, LaTiO3
-Tetragonal: MgF2, TiO2, SrLaAlO4
-Hexagonal and trigonal: SiC 2H, 4H, 6H, 15R, GaN, ZnO, LiNbO3, SiO2 (quartz), Al2O3 (sapphire), GaPO4, La3Ga5SiO14
-Orthorhombic: Mg2SiO4, NdGaO3
... Read More | Wafer XRD 200 is your fully automated high-speed X-ray diffraction platform for wafer production and research as you have never seen it before.
Wafer XRD 200 provides key data on a variety of essential parameters such as crystal orientation and resistivity, geometric features like notches and Wafer XRD 200 is your fully automated high-speed X-ray diffraction platform for wafer production and research as you have never seen it before.
Wafer XRD 200 provides key data on a variety of essential parameters such as crystal orientation and resistivity, geometric features like notches and flats, distance measurements, and much more – within just a few seconds. Designed to fit seamlessly into your process line.
Features and Benefits
- Ultra-fast precision with proprietary scan technology
The method requires only one wafer rotation to gather all the necessary data to fully determine the orientation, which delivers high precision at a very low measuring time – in the range of a few seconds.
- Fully automated handling and sorting
Wafer XRD 200 is designed to optimize your throughput and productivity. Full automation of handling and sorting and detailed data transmission tools, make it a powerful and efficient element in your QC process.
- Easy connectivity
Wafer XRD 200’s powerful automation is compatible with both MES and SECS/GEM interfaces. It fits easily into your new or existing process.
- High precision, deeper insight
Understand your materials like never before with Wafer XRD 200’s key measurements. Wafer XRD 200 measures:
-Crystal orientation
-Notch position, depth, and opening angle
-Diameter
-Flat position and length
-Resistivity
The typical standard deviation tilt (example: Si 100) for the Azimuthal-scan is <0.003o, minimum <0.001o.
- Powerful and versatile
The Wafer XRD 200 makes a wide range of measurements possible at speed – which will add real value to your processes, whether in research or production. But that is not the only way in which the Wafer XRD 200 is versatile and flexible.
Wafer XRD 200 makes analysis easy and fast for hundreds of potential samples, including:
-Si
-SiC
-AlN
-Al2O3 (sapphire)
-GaAs
-Quartz
-LiNbO3
-BBO
... Read More | Meet the Wafer XRD 300: your high-speed X-ray diffraction module for 300mm wafer production providing key data on a variety of essential parameters such as crystal orientation and geometric features like notches, flats, and much more – designed to fit seamlessly into your process line.
Features Meet the Wafer XRD 300: your high-speed X-ray diffraction module for 300mm wafer production providing key data on a variety of essential parameters such as crystal orientation and geometric features like notches, flats, and much more – designed to fit seamlessly into your process line.
Features and Benefits
- Ultra-fast precision with our proprietary scan technology
The used method requires only one rotational scan to gather all the necessary data to fully determine the crystal orientation, which delivers high precision at a very low measuring time – in the range of a few seconds.
- Fully automated handling and sorting
Wafer XRD 300 is designed to maximize your throughput and productivity. Full integration into your handling and sorting automation makes it a powerful and efficient addition to your process.
- Easy connectivity
Wafer XRD 300’s powerful automation fits easily into your new or existing process, as it is compatible with both MES and SECS/GEM interfaces.
- High precision, deeper insight
Understand your materials like never before with Wafer XRD 300’s key measurements including:
-Crystal orientation
-Notch position, depth, and opening angle
-Diameter
-Flat position and length
-Further sensors available on request
The typical standard deviation tilt (example: Si 100) for the Azimuthal-scan is <0.003o.
- Powerful and versatile
As semiconductor research evolves, it has never been more important to measure a variety of samples. Wafer XRD 300 makes analysis easy and fast for hundreds of materials, including:
-Si
-SiC
-AlN
-Al2O3 (sapphire)
-GaAs
-Quartz
-LiNbO3
-BBO
... Read More | The X’Pert3 Materials Research Diffractometer (MRD) is the system of choice for detailed structural analysis of advanced semiconductors, thin film, and nanomaterials. It handles a wide variety of X-ray scattering methods, including high resolution diffraction, in-plane diffraction, reflectivity, The X’Pert3 Materials Research Diffractometer (MRD) is the system of choice for detailed structural analysis of advanced semiconductors, thin film, and nanomaterials. It handles a wide variety of X-ray scattering methods, including high resolution diffraction, in-plane diffraction, reflectivity, thin film phase analysis, wafer mapping, GISAXS, stress, texture and nonambient analysis. The X’Pert3 MRD features the highest resolution goniometer with Heidenhain encoders for lightening fast positioning, a 5 axis cradle allowing for support and mapping of wafers up to 6 inches in diameter, and a wide variety of advanced optics and detectors, including the PIXcel3D for fast reciprocal space mapping.... Read More |