| Description | XRD-OEM is a game-changer for your production processes. Built to withstand the challenging conditions of grinding and sawing, this X-ray diffraction instrument offers seamless integration with any processing system thanks to its industry-standard interfacing. XRD-OEM provides independent XRD-OEM is a game-changer for your production processes. Built to withstand the challenging conditions of grinding and sawing, this X-ray diffraction instrument offers seamless integration with any processing system thanks to its industry-standard interfacing. XRD-OEM provides independent orientation measurement of ingots, boules, or panels, enabling measurements on both flat surfaces and circumferences – while optical notch detection ensures precise pre-alignment before sawing or grinding processes.
Features and Benefits
- Compact and connected
Designed to integrate effortlessly with any automation or processing system, XRD-OEM enables a streamlined, efficient, and continuous operation. Its compact form and standard industrial interfaces ensure that it fits easily into any manufacturing setup and works well with your existing instruments and systems.
- Tough enough for your process
Built for resilience, XRD-OEM can be deployed in whichever environment you need it, including in grinding and sawing processes. It stays reliable and precise, even under demanding production conditions.
- Fast and precise
XRD-OEM offers automated precision where it matters the most. Precise determination of crystal orientation supports your high standards of quality control while optimizing your processes for greater efficiency and overall quality.
XRD-OEM can determine crystal orientation on both flat surfaces and circumferences for extra versatility.
- Optical notch detection
Optical notch detection precisely identifies and characterizes flat and notch features on your samples – essential during the pre-alignment of large ingots before the sawing or grinding processes.
- Wide range of sample sizes
XRD-OEM can determine crystal orientation on both flat surfaces and circumferences for extra versatility.
... Read More | Quick and precise crystal orientation measurement has never been so accessible – meet the SDCOM, your user-friendly compact XRD. The azimuthal scan method unlocks ultra-fast measurement, with results returned in under five seconds.
SDCOM delivers the highest level of precision of up to 0.01o, Quick and precise crystal orientation measurement has never been so accessible – meet the SDCOM, your user-friendly compact XRD. The azimuthal scan method unlocks ultra-fast measurement, with results returned in under five seconds.
SDCOM delivers the highest level of precision of up to 0.01o, and with a wide variety of sample holders and transfer fixtures including a marking option for lateral crystal direction, this easy-to-use compact is the ideal solution for many applications within wafer processing and research.
Features and Benefits
- Ultra-fast and precise: azimuthal scan method
The azimuthal scan method requires only one measuring circle to gather all the necessary data to fully determine the orientation, which delivers high precision at a very low measuring time – in the range of a few seconds.
The sample is rotated 360o, with the X-ray source and detector positioned to achieve a certain number of reflections per turn. These reflections enable the orientation of the crystal lattice to be measured in relation to the rotation axis with high precision in a short period of time.
- Compact and versatile
SDCOM is lightweight and compact, making it easily movable and able to fit easily into your process – whether in research or industry. The XRD Suite software is both powerful and intuitive, making it convenient and easy to operate for a range of users.
Flexibility is key to the SDCOM, which is especially clear in the range of materials it can measure. The SDCOM can measure crystals starting from 1 mm in size, and examples of measurable materials include:
-Cubic, arbitrary unknown orientation: Si, Ge, GaAs, GaP, InP
-Cubic, special orientation: Ag, Au, Ni, Pt, GaSb, InAs, InSb, AlSb, ZnTe, CdTe, SiC3C, PbS, PbTe, SnTe, MgO, LiF, MgAl2O4, SrTiO3, LaTiO3
-Tetragonal: MgF2, TiO2, SrLaAlO4
-Hexagonal and trigonal: SiC 2H, 4H, 6H, 15R, GaN, ZnO, LiNbO3, SiO2 (quartz), Al2O3 (sapphire), GaPO4, La3Ga5SiO14
-Orthorhombic: Mg2SiO4, NdGaO3
There is also a variety of sample holders and transfer fixtures that can further expand the possibilities of your SDCOM’s applications, ensuring compatibility with your workflow. Manual and motorized wafer mapping stages are also available.
- User-friendly precision
SDCOM delivers excellent precision of up to 0.01o depending on the sample, and is able to measure crystals ranging from 1 mm and upwards in size. This precision is maintained at the highest speeds thanks to the azimuthal scan method, which provides full characterization of crystal orientation within a single measuring rotation. There is also an option to include a lateral crystal direction marking function.
Thanks to manual handling and intuitive software design, the SDCOM is easy to use and accessible for a range of user types – practical in both research and industry, where user experience levels may vary.
- Cost-effective
SDCOM’s X-ray tube is air-cooled, eliminating the need for water cooling. Thanks to the SDCOM’s efficiency and small footprint, its energy consumption is kept to a minimum – and so are your running costs.
... Read More | Wafer XRD 200 is your fully automated high-speed X-ray diffraction platform for wafer production and research as you have never seen it before.
Wafer XRD 200 provides key data on a variety of essential parameters such as crystal orientation and resistivity, geometric features like notches and Wafer XRD 200 is your fully automated high-speed X-ray diffraction platform for wafer production and research as you have never seen it before.
Wafer XRD 200 provides key data on a variety of essential parameters such as crystal orientation and resistivity, geometric features like notches and flats, distance measurements, and much more – within just a few seconds. Designed to fit seamlessly into your process line.
Features and Benefits
- Ultra-fast precision with proprietary scan technology
The method requires only one wafer rotation to gather all the necessary data to fully determine the orientation, which delivers high precision at a very low measuring time – in the range of a few seconds.
- Fully automated handling and sorting
Wafer XRD 200 is designed to optimize your throughput and productivity. Full automation of handling and sorting and detailed data transmission tools, make it a powerful and efficient element in your QC process.
- Easy connectivity
Wafer XRD 200’s powerful automation is compatible with both MES and SECS/GEM interfaces. It fits easily into your new or existing process.
- High precision, deeper insight
Understand your materials like never before with Wafer XRD 200’s key measurements. Wafer XRD 200 measures:
-Crystal orientation
-Notch position, depth, and opening angle
-Diameter
-Flat position and length
-Resistivity
The typical standard deviation tilt (example: Si 100) for the Azimuthal-scan is <0.003o, minimum <0.001o.
- Powerful and versatile
The Wafer XRD 200 makes a wide range of measurements possible at speed – which will add real value to your processes, whether in research or production. But that is not the only way in which the Wafer XRD 200 is versatile and flexible.
Wafer XRD 200 makes analysis easy and fast for hundreds of potential samples, including:
-Si
-SiC
-AlN
-Al2O3 (sapphire)
-GaAs
-Quartz
-LiNbO3
-BBO
... Read More | The X’Pert3 Materials Research Diffractometer (MRD) is the system of choice for detailed structural analysis of advanced semiconductors, thin film, and nanomaterials. It handles a wide variety of X-ray scattering methods, including high resolution diffraction, in-plane diffraction, reflectivity, The X’Pert3 Materials Research Diffractometer (MRD) is the system of choice for detailed structural analysis of advanced semiconductors, thin film, and nanomaterials. It handles a wide variety of X-ray scattering methods, including high resolution diffraction, in-plane diffraction, reflectivity, thin film phase analysis, wafer mapping, GISAXS, stress, texture and nonambient analysis. The X’Pert3 MRD features the highest resolution goniometer with Heidenhain encoders for lightening fast positioning, a 5 axis cradle allowing for support and mapping of wafers up to 6 inches in diameter, and a wide variety of advanced optics and detectors, including the PIXcel3D for fast reciprocal space mapping.... Read More | The X’Pert3 MRD-XL Materials Research Diffractometer is the system of choice for high resolution diffraction and scattering analysis of wafers up to 300mm in diameter. It handles a wide variety of X-ray scattering methods, including high resolution diffraction, in-plane diffraction, reflectivity, The X’Pert3 MRD-XL Materials Research Diffractometer is the system of choice for high resolution diffraction and scattering analysis of wafers up to 300mm in diameter. It handles a wide variety of X-ray scattering methods, including high resolution diffraction, in-plane diffraction, reflectivity, thin film phase analysis, wafer mapping, GISAXS, stress, texture and nonambient analysis. The X’Pert3 MRD features the highest resolution goniometer with Heidenhain encoders for lightening fast positioning, a 5 axis cradle allowing for support and mapping of wafers up to 6 inches in diameter, and a wide variety of advanced optics and detectors, including the PIXcel3D for fast reciprocal space mapping. The X’Pert3 MRD-XL also offers a sophisticated, automatic wafer loader option that enables the X'Pert3 MRD XL to function as an 'in-wall' system, with the wafer being loaded from a clean room environment and placed on to a self-centered wafer holder.... Read More |