Description | The X’Pert3 MRD-XL Materials Research Diffractometer is the system of choice for high resolution diffraction and scattering analysis of wafers up to 300mm in diameter. It handles a wide variety of X-ray scattering methods, including high resolution diffraction, in-plane diffraction, reflectivity, The X’Pert3 MRD-XL Materials Research Diffractometer is the system of choice for high resolution diffraction and scattering analysis of wafers up to 300mm in diameter. It handles a wide variety of X-ray scattering methods, including high resolution diffraction, in-plane diffraction, reflectivity, thin film phase analysis, wafer mapping, GISAXS, stress, texture and nonambient analysis. The X’Pert3 MRD features the highest resolution goniometer with Heidenhain encoders for lightening fast positioning, a 5 axis cradle allowing for support and mapping of wafers up to 6 inches in diameter, and a wide variety of advanced optics and detectors, including the PIXcel3D for fast reciprocal space mapping. The X’Pert3 MRD-XL also offers a sophisticated, automatic wafer loader option that enables the X'Pert3 MRD XL to function as an 'in-wall' system, with the wafer being loaded from a clean room environment and placed on to a self-centered wafer holder.... Read More | Ultra-fast, precise (up to (1/100)o crystal orientation at your fingertips. DDCOM acquires reliable results more than 100 times faster than the traditional methods with additional time savings due to the top down-measurement geometry. This highly versatility instrument utilizes an air-cooled X-ray Ultra-fast, precise (up to (1/100)o crystal orientation at your fingertips. DDCOM acquires reliable results more than 100 times faster than the traditional methods with additional time savings due to the top down-measurement geometry. This highly versatility instrument utilizes an air-cooled X-ray tube and portable design to ensure lower running costs and maximum convenience, ideal for quality control, marking, and research applications.
Features and Benefits
- Ultra fast accuracy
Our proprietary scan method requires only one scan rotation to gather all the necessary data for crystal orientation determination, delivering precise results in 10 seconds (single rotation).
The material-specific instrument geometry enables the orientation of the crystal lattice to be measured in relation to the rotation axis ultra-fast with precision increasing with a number of scan rotations.
- Compact, user-friendly format
The compact design of DDCOM allows the system to fit into any setting. The software is both powerful and intuitive, making it convenient and easy to operate for a range of users.
- Precise, efficient control
Maintain control of cutting, grinding, and lapping processes with high precision up to 1/100o. DDCOM delivers complete lattice orientation of single crystals and is designed for the azimuthal setting and marking of crystal orientation.
Pre-programmed crystal parameters enable the determination of arbitrary unknown orientation of various structures and aid in refining the workflow for greater efficiency. Various stage accessories enable metrology in different process steps.
- Versatile and cost-effective
DDCOM is well-equipped for both research and production environments in which a range of sample types need to be analyzed. Operating costs are low for the DDCOM, thanks to its low energy consumption and air-cooled X-ray tube – no water cooling is required.
The instrument can measure a range of different materials with varying structures making it a versatile addition to any laboratory. Some examples of measurable materials include:
-Cubic, arbitrary unknown orientation: Si, Ge, GaAs, GaP, InP
-Cubic, special orientation: Ag, Au, Ni, Pt, GaSb, InAs, InSb, AlSb, ZnTe, CdTe, SiC3C, PbS, PbTe, SnTe, MgO, LiF, MgAl2O4, SrTiO3, LaTiO3
-Tetragonal: MgF2, TiO2, SrLaAlO4
-Hexagonal and trigonal: SiC 2H, 4H, 6H, 15R, GaN, ZnO, LiNbO3, SiO2 (quartz), Al2O3 (sapphire), GaPO4, La3Ga5SiO14
-Orthorhombic: Mg2SiO4, NdGaO3
... Read More | With the 3rd generation Empyrean, Malvern Panalytical has now redefined the concept of a multipurpose diffractometer: our newly designed MultiCore Optics enable the largest variety of measurements without any manual intervention. Empyrean has the unique ability to measure all sample types - from With the 3rd generation Empyrean, Malvern Panalytical has now redefined the concept of a multipurpose diffractometer: our newly designed MultiCore Optics enable the largest variety of measurements without any manual intervention. Empyrean has the unique ability to measure all sample types - from powders to thin films, from nanomaterials to solid objects - on a single instrument. The world of materials science is constantly changing and the life of a high performance diffractometer is much longer than the typical horizon of any research project. With Empyrean, you are ready for anything the future holds.
Empyrean is the only platform that does it all, delivering the best data quality on every sample types. It covers the largest set of X-ray diffraction, scattering and imaging applications in one single instrument. Moreover, Empyrean not only meets the high expectations of scientists and XRD experts today, but will continue to do so as research themes evolve Empyrean is ideal for teaching purposes, thanks to the large doors that open completely, allowing access to the system to several people; but at the same time is perfect to perform measurements in demanding R&D environments in several industries.
Features: - Highest data quality on every sample
- Multipurpose and future proof
- Hybrid PIXel technologies
- MultiCore Optics
- PreFIX
- Good laboratory practice
- Customized solutions for X-ray diffraction
... Read More | Wafer XRD 200 is your fully automated high-speed X-ray diffraction platform for wafer production and research as you have never seen it before.
Wafer XRD 200 provides key data on a variety of essential parameters such as crystal orientation and resistivity, geometric features like notches and Wafer XRD 200 is your fully automated high-speed X-ray diffraction platform for wafer production and research as you have never seen it before.
Wafer XRD 200 provides key data on a variety of essential parameters such as crystal orientation and resistivity, geometric features like notches and flats, distance measurements, and much more – within just a few seconds. Designed to fit seamlessly into your process line.
Features and Benefits
- Ultra-fast precision with proprietary scan technology
The method requires only one wafer rotation to gather all the necessary data to fully determine the orientation, which delivers high precision at a very low measuring time – in the range of a few seconds.
- Fully automated handling and sorting
Wafer XRD 200 is designed to optimize your throughput and productivity. Full automation of handling and sorting and detailed data transmission tools, make it a powerful and efficient element in your QC process.
- Easy connectivity
Wafer XRD 200’s powerful automation is compatible with both MES and SECS/GEM interfaces. It fits easily into your new or existing process.
- High precision, deeper insight
Understand your materials like never before with Wafer XRD 200’s key measurements. Wafer XRD 200 measures:
-Crystal orientation
-Notch position, depth, and opening angle
-Diameter
-Flat position and length
-Resistivity
The typical standard deviation tilt (example: Si 100) for the Azimuthal-scan is <0.003o, minimum <0.001o.
- Powerful and versatile
The Wafer XRD 200 makes a wide range of measurements possible at speed – which will add real value to your processes, whether in research or production. But that is not the only way in which the Wafer XRD 200 is versatile and flexible.
Wafer XRD 200 makes analysis easy and fast for hundreds of potential samples, including:
-Si
-SiC
-AlN
-Al2O3 (sapphire)
-GaAs
-Quartz
-LiNbO3
-BBO
... Read More | The X’Pert3 Materials Research Diffractometer (MRD) is the system of choice for detailed structural analysis of advanced semiconductors, thin film, and nanomaterials. It handles a wide variety of X-ray scattering methods, including high resolution diffraction, in-plane diffraction, reflectivity, The X’Pert3 Materials Research Diffractometer (MRD) is the system of choice for detailed structural analysis of advanced semiconductors, thin film, and nanomaterials. It handles a wide variety of X-ray scattering methods, including high resolution diffraction, in-plane diffraction, reflectivity, thin film phase analysis, wafer mapping, GISAXS, stress, texture and nonambient analysis. The X’Pert3 MRD features the highest resolution goniometer with Heidenhain encoders for lightening fast positioning, a 5 axis cradle allowing for support and mapping of wafers up to 6 inches in diameter, and a wide variety of advanced optics and detectors, including the PIXcel3D for fast reciprocal space mapping.... Read More |