| Description | Ultra-fast, precise (up to (1/100)o crystal orientation at your fingertips. DDCOM acquires reliable results more than 100 times faster than the traditional methods with additional time savings due to the top down-measurement geometry. This highly versatility instrument utilizes an air-cooled X-ray Ultra-fast, precise (up to (1/100)o crystal orientation at your fingertips. DDCOM acquires reliable results more than 100 times faster than the traditional methods with additional time savings due to the top down-measurement geometry. This highly versatility instrument utilizes an air-cooled X-ray tube and portable design to ensure lower running costs and maximum convenience, ideal for quality control, marking, and research applications.
Features and Benefits - Ultra fast accuracy
Our proprietary scan method requires only one scan rotation to gather all the necessary data for crystal orientation determination, delivering precise results in 10 seconds (single rotation).
The material-specific instrument geometry enables the orientation of the crystal lattice to be measured in relation to the rotation axis ultra-fast with precision increasing with a number of scan rotations.
- Compact, user-friendly format
The compact design of DDCOM allows the system to fit into any setting. The software is both powerful and intuitive, making it convenient and easy to operate for a range of users.
- Precise, efficient control
Maintain control of cutting, grinding, and lapping processes with high precision up to 1/100o. DDCOM delivers complete lattice orientation of single crystals and is designed for the azimuthal setting and marking of crystal orientation.
Pre-programmed crystal parameters enable the determination of arbitrary unknown orientation of various structures and aid in refining the workflow for greater efficiency. Various stage accessories enable metrology in different process steps.
- Versatile and cost-effective
DDCOM is well-equipped for both research and production environments in which a range of sample types need to be analyzed. Operating costs are low for the DDCOM, thanks to its low energy consumption and air-cooled X-ray tube – no water cooling is required.
The instrument can measure a range of different materials with varying structures making it a versatile addition to any laboratory. Some examples of measurable materials include:
-Cubic, arbitrary unknown orientation: Si, Ge, GaAs, GaP, InP
-Cubic, special orientation: Ag, Au, Ni, Pt, GaSb, InAs, InSb, AlSb, ZnTe, CdTe, SiC3C, PbS, PbTe, SnTe, MgO, LiF, MgAl2O4, SrTiO3, LaTiO3
-Tetragonal: MgF2, TiO2, SrLaAlO4
-Hexagonal and trigonal: SiC 2H, 4H, 6H, 15R, GaN, ZnO, LiNbO3, SiO2 (quartz), Al2O3 (sapphire), GaPO4, La3Ga5SiO14
-Orthorhombic: Mg2SiO4, NdGaO3
... Read More | Wafer XRD 200 is your fully automated high-speed X-ray diffraction platform for wafer production and research as you have never seen it before.
Wafer XRD 200 provides key data on a variety of essential parameters such as crystal orientation and resistivity, geometric features like notches and Wafer XRD 200 is your fully automated high-speed X-ray diffraction platform for wafer production and research as you have never seen it before.
Wafer XRD 200 provides key data on a variety of essential parameters such as crystal orientation and resistivity, geometric features like notches and flats, distance measurements, and much more – within just a few seconds. Designed to fit seamlessly into your process line.
Features and Benefits - Ultra-fast precision with proprietary scan technology
The method requires only one wafer rotation to gather all the necessary data to fully determine the orientation, which delivers high precision at a very low measuring time – in the range of a few seconds.
- Fully automated handling and sorting
Wafer XRD 200 is designed to optimize your throughput and productivity. Full automation of handling and sorting and detailed data transmission tools, make it a powerful and efficient element in your QC process.
- Easy connectivity
Wafer XRD 200’s powerful automation is compatible with both MES and SECS/GEM interfaces. It fits easily into your new or existing process.
- High precision, deeper insight
Understand your materials like never before with Wafer XRD 200’s key measurements. Wafer XRD 200 measures:
-Crystal orientation
-Notch position, depth, and opening angle
-Diameter
-Flat position and length
-Resistivity
The typical standard deviation tilt (example: Si 100) for the Azimuthal-scan is <0.003o, minimum <0.001o.
- Powerful and versatile
The Wafer XRD 200 makes a wide range of measurements possible at speed – which will add real value to your processes, whether in research or production. But that is not the only way in which the Wafer XRD 200 is versatile and flexible.
Wafer XRD 200 makes analysis easy and fast for hundreds of potential samples, including:
-Si
-SiC
-AlN
-Al2O3 (sapphire)
-GaAs
-Quartz
-LiNbO3
-BBO
... Read More | XRD-OEM is a game-changer for your production processes. Built to withstand the challenging conditions of grinding and sawing, this X-ray diffraction instrument offers seamless integration with any processing system thanks to its industry-standard interfacing. XRD-OEM provides independent XRD-OEM is a game-changer for your production processes. Built to withstand the challenging conditions of grinding and sawing, this X-ray diffraction instrument offers seamless integration with any processing system thanks to its industry-standard interfacing. XRD-OEM provides independent orientation measurement of ingots, boules, or panels, enabling measurements on both flat surfaces and circumferences – while optical notch detection ensures precise pre-alignment before sawing or grinding processes.
Features and Benefits
- Compact and connected
Designed to integrate effortlessly with any automation or processing system, XRD-OEM enables a streamlined, efficient, and continuous operation. Its compact form and standard industrial interfaces ensure that it fits easily into any manufacturing setup and works well with your existing instruments and systems.
- Tough enough for your process
Built for resilience, XRD-OEM can be deployed in whichever environment you need it, including in grinding and sawing processes. It stays reliable and precise, even under demanding production conditions.
- Fast and precise
XRD-OEM offers automated precision where it matters the most. Precise determination of crystal orientation supports your high standards of quality control while optimizing your processes for greater efficiency and overall quality.
XRD-OEM can determine crystal orientation on both flat surfaces and circumferences for extra versatility.
- Optical notch detection
Optical notch detection precisely identifies and characterizes flat and notch features on your samples – essential during the pre-alignment of large ingots before the sawing or grinding processes.
- Wide range of sample sizes
XRD-OEM can determine crystal orientation on both flat surfaces and circumferences for extra versatility.
... Read More | Empyrean XAS brings laboratory-based XANES and EXAFS measurements to the X-ray diffraction (XRD), X-ray scattering, and imaging techniques of the Empyrean platform.
By enabling multiple structural techniques on a single instrument, Empyrean connects long-range structure, nanoscale organization, Empyrean XAS brings laboratory-based XANES and EXAFS measurements to the X-ray diffraction (XRD), X-ray scattering, and imaging techniques of the Empyrean platform.
By enabling multiple structural techniques on a single instrument, Empyrean connects long-range structure, nanoscale organization, and local chemical environments within one consistent workflow.
Key highlights of the Empyrean XAS:
- Reveal oxidation state, local structure, and chemical state information beyond average crystallographic structure.
- Perform routine XANES and EXAFS measurements without competing for synchrotron beamtime.
- Combine XAS, XRD, scattering, PDF, and imaging on a single Empyrean platform.
- Generate synchrotron-comparable data with excellent agreement to reference synchrotron measurements.
... Read More | The X’Pert3 Materials Research Diffractometer (MRD) is the system of choice for detailed structural analysis of advanced semiconductors, thin film, and nanomaterials. It handles a wide variety of X-ray scattering methods, including high resolution diffraction, in-plane diffraction, reflectivity, The X’Pert3 Materials Research Diffractometer (MRD) is the system of choice for detailed structural analysis of advanced semiconductors, thin film, and nanomaterials. It handles a wide variety of X-ray scattering methods, including high resolution diffraction, in-plane diffraction, reflectivity, thin film phase analysis, wafer mapping, GISAXS, stress, texture and nonambient analysis. The X’Pert3 MRD features the highest resolution goniometer with Heidenhain encoders for lightening fast positioning, a 5 axis cradle allowing for support and mapping of wafers up to 6 inches in diameter, and a wide variety of advanced optics and detectors, including the PIXcel3D for fast reciprocal space mapping.... Read More |