New Levels of AFM Ease of Use and Productivity Accelerate Next-Generation Product Development
September 24, 2012—Bruker Nano Surfaces Division (Santa Barbara, CA) has shipped a Dimension Icon® Atomic Force Microscope (AFM) to the European Technical Centre (Lathom, UK) of the global glass manufacturer NSG Group. The Dimension Icon system is equipped with Bruker’s self-optimizing ScanAsyst® Imaging Mode and PeakForce TUNA™ module to enable unprecedented ease of use in conductivity mapping and other difficult materials characterization.
“Following a thorough review of available instrumentation, we were confident of the resolution, AFM capabilities and long-term performance of this latest instrument from Bruker, to replace our earlier vintage MultiMode AFM” said Keith Arnold, Microscopy and Surface Analysis, of NSG Group. “The potential for higher throughput has been realized with Icon and PeakForce TUNA and we are pleased with the options their current product now offers, particularly for our advanced materials R&D.”
“The Dimension Icon is the first easy to use and high-resolution, large-sample AFM specifically designed to address atomic force microscopy needs of both the research lab and industrial applications,” explained David Rossi, Executive Vice President and General Manager of Bruker's AFM Unit. "PeakForce TUNA and the rest of our new suite of products build on the foundation of PeakForce Tapping and ScanAsyst modes to provide non-destructive and artifact-free nanoelectrical and electrochemical characterization in the growing arena of future energy generation and storage materials."
About Dimension Icon:
The Dimension Icon with ScanAsyst brings new levels of performance, functionality, and AFM accessibility to nanoscale researchers in science and industry. Building upon the world's most utilized large-sample AFM platform, the Icon system is the culmination of decades of technological innovation, customer feedback and industry-leading application flexibility. It has been designed from top to bottom to deliver revolutionary low drift and low noise that allows users to achieve artifact-free images in minutes instead of hours, enabling increased productivity.